华中科技大学主页平台管理系统 Cheng Zhang--英文主页-- Large-area High Aspect-ratio Plasmonic Interference Lithography Utilizing Single High-k Mode

Cheng Zhang Professor

张诚，华中科技大学光学与电子信息学院教授、博士生导师。长期从事微纳光子学与微纳加工制造等领域的研究工作。在 Science、Nature Photonics、Light: Science & Applications、Advanced Materials、Physical Review Letters、Laser & Photonics Reviews、Nano Letters、ACS Nano、ACS Photonics、Optica等学术期刊发表研究论文60余篇，Google Scholar引用5500余次，H因子40。申请美国发明专利6项，已获授权3项。在国际...Detials

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Paper Publications Current position: 英文主页 > Scientific Research > Paper Publications

Large-area High Aspect-ratio Plasmonic Interference Lithography Utilizing Single High-k Mode

Release time:2021-06-01 Hits:

Indexed by:Journal paper
Journal:ACS Nano
Volume:10
Issue:4
Page Number:4039–4045
Date of Publication:2016-04-13
Links to published journals:https://pubs.acs.org/doi/10.1021/acsnano.5b06137

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