Indexed by: Journal paper

First Author: Teng Luo

Correspondence Author: Zhen Li

Co-author: He Qiang,Xiangshui Miao

Journal: Optics Express

Included Journals: SCI

Affiliation of Author(s): 光学与电子信息学院

Discipline: Engineering

First-Level Discipline: Other specialties in Optical Engineering

Document Type: J

DOI number: 10.1364/OE.24.005754

Date of Publication: 2016-07-21

Abstract: Metallic glass film of Pr60Al10Ni10Cu20 is proposed to be used as a resist of phase-change lithography (PCL). PCL is a mask-less lithography technology by using laser-direct-writing to create the intended nanopatterns. Thermal distribution in the PrAlNiCu film after exposure is calculated by finite element method (FEM). Thin films are exposed by continuous-wave laser and selective etched by nitric-acid solution, and the patterns are discerned by optical and atomic force microscope. The etching rate of as-deposited PrAlNiCu is thus nearly five times of the crystalline film. These results indicate that PrAlNiCu metallic glass film is a promising resist for phase-change lithography