·Paper Publications
Study of the plasma etching process for low-loss SiO2/Si optical waveguide
Release time:2021-05-26 Hits:
Indexed by: Journal paper
Correspondence Author: LUO FENG GUANG
Journal: Thin Solid Films
Included Journals: SCI
Discipline: Engineering
First-Level Discipline: Other specialties in Optical Engineering
Document Type: J
Volume: 489
Issue: 1-2
Page Number: 229-234
ISSN No.: 0040-6090
Date of Publication: 2005-05-10
Impact Factor: 2.03