一种用于真空环境下测量光学元件面形的装置及方法
Release time:2023-06-16
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- Disigner of the Invention:
- LUO QIN,马肖杰,张恒,kidchern,Zhongkun Hu
- Type of Patent:
- Invent
- Application Number:
- ZL202110573545.1
- Application Date:
- 2021-05-25
- Authorization Date:
- 2022-08-05
- First Author:
- ZHOU MIN KANG
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