·Paper Publications
Wei Tan, Huiru Ji, Yan Mo, Donglin Ma*, “Automatic design of an extreme ultraviolet lithography objective system based on the Seidel aberration theory,” Applied Optics 61(29), 8633-8640 (2022).
Release time:2024-04-03 Hits:
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Zichao Fan, Lujia Zhao, Shengyi Cao, Jianguo Peng, Huiru Ji, Zhengbo Zhu, Shili Wei, Yan Mo, Hanyuan Chen, Donglin Ma*, “High performance telescope system design for the TianQin project,” Classical and Quantum Gravity 39 (19), 195017, 2022.
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Zichao Fan, Zhengbo Zhu, Shili Wei, Yan Mo, Yuting Zou, and Donglin Ma*, “Paraxial design of four-component zoom lens system with fixed distance between focal points by matrix optics,” Optics & Laser Technology 158, 108895 (2023).