·Patents
一种石墨相氮化碳薄膜修饰电极的制备方法
Release time:2021-05-11 Hits:
Patent Applicant: 吕晓伟,申燕
Type of Patent: Invent
Application Number: CN201610671067.7
Number of Inventors: 2
Application Date: 2016-08-16
Publication Date: 2016-12-07
Authorization Date: 2017-07-25
First Author: 申燕