·Patents
一种抑制杂散光的物质折射率测量装置
Release time:2021-04-12 Hits:
Affilication of Author(s): 光学与电子信息学院
School Sign: 华中科技大学
Patent Applicant: 华中科技大学
Disigner of the Invention: Wei Li,Kecheng Yang,Xia Min,郭文平
Type of Patent: 发明专利
Authorization number: 2017103958247
Number of Inventors: 4
Application Date: 2017-05-31
Authorization Date: 2019-11-12
First Author: 郭文平