张有为

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Current position: 英文主页 > Scientific Research > Patents
一种于多层石墨烯表面制备高k栅介质的方法
Release time:2019-03-07  Hits:

Patent Applicant: 王浩敏;张有为;杨喜超;谢晓明

Type of Patent: Invent

Application Number: CN201210385176.4

Authorization number: ZL201210385176.4

Application Date: 2012-10-11

Authorization Date: 2016-04-20