A Novel Universal Model for Extracting Specific Contact Resistivity Featuring High Resolution, Strong Variation Immunity, and Simple Fabrication Process
Release time:2024-11-27
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- Indexed by:
- 会议论文
- First Author:
- Han Kaizhen et. al.
- Journal:
- IEEE International Electron Devices Meeting
- Page Number:
- 30.3.1 - 30.3.4
- Date of Publication:
- 2023-12-09
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