Zhiqiang Jack Wang

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Zhiqiang (Jack) Wang received the B.S. degree from Hunan University, Changsha, China, in 2007 and the M.S. degree from Zhejiang University, Hangzhou, China, in 2010, both in electrical engineering. He started working toward the Ph.D. degree in the Center for Power Electronics Systems (CPES), Virginia Tech, Blacksburg, VA, USA, in 2010 and, in 2011, he transferred to the Center for Ultra-Wide-Area Resilient Electric Energy Transmission Networks (CURENT), University of Tennessee, Knoxville, TN, USA, where he received the Ph.D. degree in 2015.

 

Dr. Wang is currently a Professor with the Huazhong University of Science and Technology (HUST), Wuhan, China. Prior to joining HUST, he was with the Power Electronics and Electric Machinery Research Center, Oak Ridge National Laboratory (ORNL), Oak Ridge, TN, USA, as a Postmaster Research Associate from 2014 to 2015, full-time R&D Associate Staff Member from 2015 to 2018, and R&D Staff Member in 2019. He has also been an adjunct professor with the University of Tennessee, Knoxville, TN, USA, since 2018.

 

During the past 10 years, Dr. Wang has been working on the packaging & integration of wide bandgap power semiconductor devices, and its applications to high-temperature, high-frequency, and high-density power electronics systems. He served as a Principal Investigator at ORNL for multiple U.S. government and industry projects, focusing on the SiC power module packaging and inverter R&D in various applications. He has authored/co-authored more than 80 publications in international conferences and journals, and received more than 10 awards from ORNL and IEEE.

 

Dr. Wang is a Senior Member of IEEE. He served as the Technical Program Chair for WiPDA-Asia 2021 conference, and session chair/topic chair for APEC and ECCE conferences. He is currently the Transaction Paper Review Chair for the IEEE IAS Power Electronics Devices and Components Committee, Deputy Chair of IEEE Power Electronics Society Wuhan Chapter, and is an Associate Editor of IEEE Transactions on Industry Applications.