·Patents
一种于石墨烯表面制备高k栅介质薄膜的方法
Release time:2019-03-07 Hits:
Patent Applicant: 王浩敏;张有为;沈大伟;杨喜超;谢晓明
Type of Patent: Invent
Application Number: CN201210385259.3
Authorization number: ZL201210385259.3
Application Date: 2012-10-11
Authorization Date: 2015-06-10