ZUO Duluo

Paper Publications

Kinetic simulation of discharge excited ArF excimer laser and parameter analysis

Release time:2018-09-26  Hits:
Indexed by:Journal paper Document Code:081006 First Author:罗时文 Correspondence Author:左都罗 Co-author:罗时文; 左都罗; 王新兵 Journal:High Power Laser and Particle Beams Affiliation of Author(s):Wuhan National Laboratory for Optoelectronics Document Type:J Volume:27 Issue:8 Page Number:081006-01-081006-06 ISSN No.:1001-4322 Date of Publication:2015-08-15 Abstract:A one-dimensional fluid model is used to investigate the kinetics of discharge excited ArF excimer laser. Voltage-current waveforms of the gas discharge process coupling with the discharge circuit are obtained. Temporal-spatial evolution of electron number density, photon number density and electric field are obtained and influence of discharge parameters on the laser output is analyzed. The results show that circuit parameters, pressure and fluorine gas ratio all have significant influence on laser output. The inductance has little influence on the output which result in a large parameter set Links to published journals:http://www.hplpb.com.cn/CN/10.11884/HPLPB201527.081006