论文类型：期刊论文
第一作者：Teng Luo
通讯作者：Zhen Li
合写作者：何强,Xiangshui Miao
发表刊物：Optics Express
收录刊物：SCI
所属单位：光学与电子信息学院
学科门类：工学
一级学科：光学工程
文献类型：J
DOI码：10.1364/OE.24.005754
发表时间：2016-07-21
摘要：Metallic glass film of Pr60Al10Ni10Cu20 is proposed to be used as a resist of phase-change lithography (PCL). PCL is a mask-less lithography technology by using laser-direct-writing to create the intended nanopatterns. Thermal distribution in the PrAlNiCu film after exposure is calculated by finite element method (FEM). Thin films are exposed by continuous-wave laser and selective etched by nitric-acid solution, and the patterns are discerned by optical and atomic force microscope. The etching rate of as-deposited PrAlNiCu is thus nearly five times of the crystalline film. These results indicate that PrAlNiCu metallic glass film is a promising resist for phase-change lithography