Xingsheng Wang

·Patents

Current position: 英文主页 > Scientific Research > Patents
一种超晶格忆阻器功能层材料、忆阻器单元及其制备方法
Release time:2022-06-07  Hits:

Affilication of Author(s): Huazhong University of Science and Technology

Patent Applicant: Xingsheng Wang,Chengxu Wang,Xiangshui Miao

Type of Patent: Invent

Application Number: 201911350103.X

Authorization number: ZL201911350103.X

Number of Inventors: 3

Application Date: 2019-12-24

Authorization Date: 2022-06-07