·Paper Publications
Comprehensive investigation on CF4/O2-plasma treating the interfaces of stacked gate dielectric in MoS2 transistors
Release time:2021-05-21 Hits:
Indexed by: Journal paper
Document Code: 8
First Author: X. Song,
Correspondence Author: L. Liu,P. Lai
Co-author: J. P. Xu
Journal: Appl. Surf. Sci.
Included Journals: SCI
Affiliation of Author(s): 华中科技大学
Place of Publication: 英国
Discipline: Engineering
First-Level Discipline: Electronic Science And Technology
Funded by: 国家自然科学基金
Document Type: J
Volume: 542
Page Number: 148437
Date of Publication: 2020-05-08
Teaching and Research Group: 光学与电子信息学院