Dr. Jingping Xu, second-level Professor, PhD supervisor. 

  He received his bachelor's, master's and doctoral degrees from Huazhong University of Science and Technology in 1982, 1984 and 1993 respectively. From 1995 to 1999, he worked as a postdoctoral fellow at the University of Hong Kong.In recent years, he visited the University of Hong Kong and the Hong Kong Polytechnic University many times for the purpose of cooperative research.Since 2002, he has been engaged in the studies on high-k gate dielectrics and interface characteristics of Si, Ge, SiC, GaAs, InGaAs and MoS2 MOS devices, on Si-based floating gate and charge-trapping non-volatile memories and on the physical model, structure design and manufacturing process of high-k gate dielectric MOSFETs. He has published more than 200 academic papers in the field of microelectronics, including ACS Applied Materials & Interfaces、IEEE EDL、IEEE TED、APL，etc.