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Rong Chen

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Professor  
Supervisor of Doctorate Candidates  
Supervisor of Master's Candidates  

Paper Publications

Self-Aligned Patterning of Tantalum Oxide on SiO2/Cu through Redox-coupled Inherently Selective Atomic Layer Deposition

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Indexed by:Journal paper

First Author:Yicheng Li,Zilian Qi

Correspondence Author:Kun Cao,Rong Chen

Co-author:Yuxiao Lan,Yanwei Wen,Jingming Zhang,Eryan Gu,Junzhou Long,Jin Yan,Bin Shan

Journal:Nature Commun.

Included Journals:SCI

Volume:14

Page Number:4493

Date of Publication:2023-06-26

Next One:Atomic layer deposition in advanced display technologies: from photoluminescence to encapsulation