Prof. Chen Rong is Vice Dean, Professor, and Doctoral Supervisor of the School of Mechanical Science and Engineering at Huazhong University of Science and Technology. She obtained her bachelor degree from University of Science and Technology of China (USTC) in 2001 and her Master and PhD degrees from Stanford University in 2006. Prof. Chen is the recipient of Distinguished Professor of National Major Talent Project (2023), National Innovation Leading Talent (2019), Overseas High level Young Talent (2011),  Science Exploration Award, China Youth Science and Technology Award, and Outstanding Youth Achievement Transformation Award.

Prof. Chen Rong has worked at Applied Materials and Intel Research Institute in the United States, performing R&D in VLSI processes and related equipment development, and has won awards such as the SRC Simon Karecki Award and the Texas Instruments Women in Microelectronics Leadership Award. After joined HUST as a full professor in 2011, she led a team to conduct research on atomic level manufacturing, by understanding surface science, and applying this knowledge to a range of problems in sustainable energy, semiconductor processing, and nanotechnology. Her current research interests include selective atomic layer deposition method, nanoparticles modification, thin film technology for applications in optoelectronics, flexible electronics, catalysis and energy storage, as well as developing ALD apparatus for these emerging applications.  

Prof. Chen is the PI for the national key research and development program disruptive innovation project, national fund key project, 973 youth projects, etc. Prof. Chen has authored and co-authored over 200 SCI papers, edited and authored 5 Chinese and English publications, including "Atomic Layer Deposition Technology - From Manufacturing Principles to Equipment Applications", and obtained over 100 authorized invention patents. She has won two first prizes for technological inventions in Hubei Province, a provincial patent award, a winning prize in the National Disruptive Technology Innovation Competition, and has been selected twice for the "Science and Technology Innovation China - Leading Technology List". Has also led the compilation of four international standards, including "Atomic Layer Deposition", and has released one.