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Rong Chen

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一种用于纳米颗粒表面包覆的连续原子层沉积设备

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Affilication of Author(s):华中科技大学

School Sign:华中科技大学

Patent Applicant:曹坤,刘潇,张晶,李嘉伟,曲锴,竹鹏辉,向勤勇,Bin Shan,赵凯,陈蓉

Disigner of the Invention:华中科技大学

Type of Patent:Invent

Authorization number:ZL201810073257.8

Number of Inventors:7

Authorization Date:2018-01-25

First Author:Rong Chen

Pre One:用于微纳米颗粒充分分散包覆的超声流化原子层沉积装置

Next One:采用循环卷绕式原子层沉积设备提高电池稳定性的方法