·Paper Publications
Comparative investigation on NH3-plasma treating different surfaces of stack-gate dielectric Ge MOS capacitors
Release time:2021-05-21  Hits:
Indexed by: Journal paper
Document Code: 10
First Author: Zhou L
Correspondence Author: Xu J P*,Li C X
Co-author: Liu L
Journal: Applied Physics Express
Included Journals: SCI
Affiliation of Author(s): 华中科技大学
Place of Publication: 日本
Discipline: Engineering
First-Level Discipline: Electronic Science And Technology
Funded by: 国家自然科学基金
Document Type: J
Volume: 13
Page Number: 024001
Date of Publication: 2020-05-08
Teaching and Research Group: 光学与电子信息学院