徐静平

·Paper Publications

Current position: 英文主页 > Scientific Research > Paper Publications
Comparative investigation on NH3-plasma treating different surfaces of stack-gate dielectric Ge MOS capacitors
Release time:2021-05-21  Hits:

Indexed by: Journal paper

Document Code: 10

First Author: Zhou L

Correspondence Author: Xu J P*,Li C X

Co-author: Liu L

Journal: Applied Physics Express

Included Journals: SCI

Affiliation of Author(s): 华中科技大学

Place of Publication: 日本

Discipline: Engineering

First-Level Discipline: Electronic Science And Technology

Funded by: 国家自然科学基金

Document Type: J

Volume: 13

Page Number: 024001

Date of Publication: 2020-05-08

Teaching and Research Group: 光学与电子信息学院