·Paper Publications
Repair of Oxygen Vacancies and Improvement of HfO2/MoS2 Interface by NH3-Plasma Treatment
Release time:2021-05-21  Hits:
Indexed by: Journal paper
Document Code: 15
First Author: Xinyuan Zhao
Correspondence Author: Pui-To Lai,Lu Liu
Co-author: Wing-Man Tang.,Jingping Xu
Journal: IEEE Transactions on Electron Devices
Included Journals: SCI
Affiliation of Author(s): 华中科技大学
Place of Publication: 美国
Discipline: Engineering
First-Level Discipline: Electronic Science And Technology
Funded by: 国家自然科学基金
Document Type: J
Volume: 66
Issue: 10
Page Number: 4337-4342
Date of Publication: 2019-10-05
Teaching and Research Group: 光学与电子信息学院