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Rong Chen

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Patents

一种常压曲面基底的原子层沉积薄膜制备设备

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Affilication of Author(s):华中科技大学

School Sign:华中科技大学

Patent Applicant:曹坤,LI YUN,黄奕利,陈蓉,陈蓉,Bin Shan,但威,马玉春,何文杰,林骥龙,王晓雷

Disigner of the Invention:华中科技大学

Type of Patent:Invent

Authorization number:ZL201810503730.1

Number of Inventors:7

Authorization Date:2018-05-24

First Author:Rong Chen,陈蓉

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