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Rong Chen

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Professor  
Supervisor of Doctorate Candidates  
Supervisor of Master's Candidates  

Patents

Etch and passivation for high aspect ratio features

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Disigner of the Invention:Tae Won Kim,Nicolas Gani,Anisul H. Khan

Type of Patent:PCT or foreign applications

Authorization number:US 11/749,957

Number of Inventors:4

Authorization Date:2007-05-17

First Author:Rong Chen

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