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Rong Chen

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Supervisor of Doctorate Candidates  
Supervisor of Master's Candidates  

Patents

Atomic Layer Deposition Device for Massively coating Micro-nano particles

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Affilication of Author(s):华中科技大学

School Sign:华中科技大学

Disigner of the Invention:Jiawei Li,Bin Shan,Xiao Liu,Kai Qu,Jing Zhang

Type of Patent:PCT or foreign applications

Authorization number:(ZL201810614143.0) US Patent Application: 16/615,060, PCT/CN2019/082668

Number of Inventors:6

Authorization Date:2019-04-15

First Author:Rong Chen

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