- Stacey F. Bent,Rong Chen,Xirong Jiang,Marja N. Mullings,Yuji Saito.Fabrication of size-controlled, spatially distributed nanoparticles by atomic layer deposition.PCT或外国申请,US8084087,
- Donald S. Gardner,Eric C. Hannah,John L. Gustafson,Rong Chen.Charge storage device, method of making same, method of making an electrically conductive structure for same, mobile electronic device using same, and microelectronic.PCT或外国申请,US9013861; WIPO patent, PCT/US2010/029821,
- Rong Chen,Penghui Zhu,Chenlong Duan,Bin Shan,Weiming Ba.Planetary Rotation Fluidized Apparatus for Nanoparticle Atomic Layer Deposition.PCT或外国申请,(ZL201510953058.2) EP3181722, 2016.02.29 point to UK (EP3181722) and Germany (DE 602016002460.8),
- Rong Chen,Weiming Ba,Kai Qu,Yun Li,Kun Cao,Wei Dan.Nanoparticle continuous-coating device and method based on spatial atomic layer deposition.PCT或外国申请,(ZL201710423764.5) US Patent 10,914,006 B2 PCT/CN2017/088371,
- Rong Chen,Xiaolei Wang,Bin Shan,Yun Li,Jilong Lin,Yuchun Ma,Wei Dan.Modular injector and device for spatial separately atomic layer deposition method and reactor.PCT或外国申请,(ZL201710336412.6) US Patent Application: 16/493,208 (Sep 11, 2019) PCT/CN2018/073996,
- Rong Chen,Jiawei Li,Bin Shan,Xiao Liu,Kai Qu,Jing Zhang.Atomic Layer Deposition Device for Massively coating Micro-nano particles.PCT或外国申请,(ZL201810614143.0) US Patent Application: 16/615,060, PCT/CN2019/082668,
- Rong Chen,Tae Won Kim,Nicolas Gani,Anisul H. Khan.Etch and passivation for high aspect ratio features.PCT或外国申请,US 11/749,957,
- 一种基于压电传感的微振动检测器.ZL2018102746147,
- 一种循环卷绕式原子层沉积设备.ZL201710193000.1,
- 一种常压下曲面基底的原子层沉积薄膜制备设备.ZL2018105037301,
陈蓉
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